![](/img/cover-not-exists.png)
Control of microstructure and properties of copper films using ion-assisted deposition
Roy, R. A.Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575339
Date:
May, 1988
File:
PDF, 686 KB
english, 1988