Effect of plasma treatment on the density of defects at an...

Effect of plasma treatment on the density of defects at an amorphous Si:H-insulator interface

Umezu, Ikurou, Kuwamura, Takahiro, Kitamura, Kazuaki, Tsuchida, Takatsugu, Maeda, Keiji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368249
File:
PDF, 359 KB
english, 1998
Conversion to is in progress
Conversion to is failed