Scanning tunneling microscopy based lithography employing amorphous hydrogenated carbon as a high resolution resist mask
Kragler, K., Günther, E., Leuschner, R., Falk, G., Hammerschmidt, A., von Seggern, H., Saemann–Ischenko, G.Volume:
67
Year:
1995
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.114995
File:
PDF, 1.00 MB
english, 1995