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An electron cyclotron resonance plasma deposition technique employing magnetron mode sputtering
Takahashi, ChiharuVolume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575588
Date:
July, 1988
File:
PDF, 613 KB
english, 1988