Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 1
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Chemical vapor deposition and characterization of high-k BaHf[sub 1−x]Ti[sub x]O[sub 3] dielectric layers for microelectronic applications
Abrutis, A., Katkus, T., Stanionyte, S., Kubilius, V., Lupina, G., Wenger, Ch., Lukosius, M.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3521386
File:
PDF, 658 KB
english, 2011