Etching of a-Si:H thin films by hydrogen plasma: A view...

The Journal of Chemical Physics 2014 / 08 Vol. 141; Iss. 8

Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry

Hadjadj, Aomar, Larbi, Fadila, Gilliot, Mickaël, Roca i Cabarrocas, Pere
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Volume:
141
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.4893558
Date:
August, 2014
File:
PDF, 1.57 MB
english, 2014
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