A study of metal-oxide-semiconductor capacitors fabricated...

A study of metal-oxide-semiconductor capacitors fabricated on SF6 and SF6+Cl2 reactive-ion-etched Si

Castán, E., Arias, J., Barbolla, J., Cabruja, E., Lora-Tamayo, E.
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Volume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.351043
File:
PDF, 1.00 MB
english, 1992
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