A study of metal-oxide-semiconductor capacitors fabricated on SF6 and SF6+Cl2 reactive-ion-etched Si
Castán, E., Arias, J., Barbolla, J., Cabruja, E., Lora-Tamayo, E.Volume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.351043
File:
PDF, 1.00 MB
english, 1992