Combining high resolution and tensorial analysis in Raman stress measurements of silicon
Bonera, Emiliano, Fanciulli, Marco, Batchelder, David N.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1592872
File:
PDF, 1.10 MB
english, 2003