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Magnetization processes and magnetoresistance in Co/Cu multilayers as a function of the Cu layer thickness.
Aitchison, P. R., Chapman, J. N., Holloway, H., Kubinski, D. J., Parsons, M.Volume:
87
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.372511
File:
PDF, 835 KB
english, 2000