Etching High Aspect Ratio Silicon Trenches

Etching High Aspect Ratio Silicon Trenches

Panda, Siddhartha, Ranade, Rajiv, Mathad, G. Swami
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Volume:
150
Year:
2003
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1603254
File:
PDF, 496 KB
english, 2003
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