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Dry etching of (Ba,Sr)TiO[sub 3] thin films using an inductively coupled plasma
Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Chang-IIVolume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1914814
File:
PDF, 428 KB
english, 2005