![](/img/cover-not-exists.png)
Effect of Cl[sub 2]∕Ar gas mixing ratio on (Pb,Sr)TiO[sub 3] thin film etching behavior in inductively coupled plasma
Kim, Gwan-Ha, Kim, Chang-IlVolume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2187989
File:
PDF, 621 KB
english, 2006