Measurements of deep penetration of low‐energy electrons...

Journal of Applied Physics 1981 / 03 Vol. 52; Iss. 3

Measurements of deep penetration of low‐energy electrons into metal‐oxide‐semiconductor structure

Nakamae, Koji, Fujioka, Hiromu, Ura, Katsumi
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Volume:
52
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.329756
Date:
March, 1981
File:
PDF, 418 KB
english, 1981
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