Formation of TiN films with low Cl concentration by pulsed...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1996 / 5 Vol. 14; Iss. 3

Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition

Hiramatsu, Kenji
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Volume:
14
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.580129
Date:
May, 1996
File:
PDF, 372 KB
english, 1996
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