The influence of annealing ambient on the shrinkage...

Applied Physics Letters 1979 Vol. 35; Iss. 10

The influence of annealing ambient on the shrinkage kinetics of oxidation-induced stacking faults in silicon

Claeys, Cor L., Declerck, Gilbert J., Van Overstraeten, Roger J.
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Volume:
35
Year:
1979
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.90940
File:
PDF, 459 KB
english, 1979
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