The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching
Steglich, Martin, Käsebier, Thomas, Zilk, Matthias, Pertsch, Thomas, Kley, Ernst-Bernhard, Tünnermann, AndreasVolume:
116
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4900996
Date:
November, 2014
File:
PDF, 5.71 MB
english, 2014