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Stability studies of ultrashallow junction formed by low energy boron implant and spike annealing
Shao, Lin, Wang, Xuemei, Rusakova, Irene, Chen, Hui, Liu, Jiarui, Bennett, Joe, Larson, Larry, Jin, Jianyue, van der Heide, P. A. W., Chu, Wei-KanVolume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1513206
File:
PDF, 463 KB
english, 2002