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Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films
Godet, C.Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575576
Date:
July, 1988
File:
PDF, 875 KB
english, 1988