Ga[sup +] beam lithography for suspended lateral beams and...

Ga[sup +] beam lithography for suspended lateral beams and nanowires

Henry, M. David, Shearn, Michael, Scherer, Axel
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3497013
File:
PDF, 745 KB
english, 2010
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