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[IEEE 2014 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2014.6.9-2014.6.12)] 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers - Systematic study of RTN in nanowire transistor and enhanced RTN by hot carrier injection and negative bias temperature instability
Ota, Kensuke, Saitoh, Masumi, Tanaka, Chika, Matsushita, Daisuke, Numata, ToshinoriYear:
2014
Language:
english
DOI:
10.1109/vlsit.2014.6894417
File:
PDF, 452 KB
english, 2014