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In situ study of the role of substrate temperature during atomic layer deposition of HfO2 on InP
Dong, H., Santosh, K.C.,, Qin, X., Brennan, B., McDonnell, S., Zhernokletov, D., Hinkle, C. L., Kim, J., Cho, K., Wallace, R. M.Volume:
114
Year:
2013
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4825218
File:
PDF, 1.75 MB
english, 2013