Etch Properties of Gallium Nitride Using Chemically...

Japanese Journal of Applied Physics 1998 / 12 Vol. 37; Iss. Part 1, No

Etch Properties of Gallium Nitride Using Chemically Assisted Ion Beam Etching (CAIBE)

Lee, Weon-Jeong, Kim, Hyeon-Soo, Lee, Jae-Won, Kim, Tae-Il, Yeom, Geun-Young
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.7006
Date:
December, 1998
File:
PDF, 1.18 MB
1998
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