Atomic Contribution to Valence Band Density of States in...

Defect and Diffusion Forum 2010 / 4 Vol. 297-301

Atomic Contribution to Valence Band Density of States in Gallium Oxide and Silicon Oxide Nano Layered Films

Takeuchi, Toshio, Nishinaga, Jiro, Kawaharazuka, Atsushi, Horikoshi, Yoshiji
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Volume:
297-301
Language:
english
Journal:
Defect and Diffusion Forum
DOI:
10.4028/www.scientific.net/DDF.297-301.849
Date:
April, 2010
File:
PDF, 309 KB
english, 2010
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