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[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - A new plasma ash method to prevent resist from flowing into contact and via holes
Boumerzoug, Mohamed, Parker, JohnYear:
2010
Language:
english
DOI:
10.1109/asmc.2010.5551453
File:
PDF, 707 KB
english, 2010