Improving the Etch Selectivity of ZrO 2 Thin Films over Si by Using High Density Plasma
Woo, Jong-Chang, Kim, Gwan-Ha, Kim, Dong-Pyo, Um, Doo-Seung, Kim, Chang-IlVolume:
384
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190902892766
Date:
June, 2009
File:
PDF, 3.07 MB
english, 2009