Quantitative depth profiling of ultrathin high-k stacks...

Quantitative depth profiling of ultrathin high-k stacks with full spectrum time of flight–secondary ion mass spectrometry

Py, Matthieu, Barnes, Jean-Paul, Boujamaa, Rachid, Gros-Jean, Michael, Nakajima, Kaoru, Kimura, Kenji, Roukoss, Charbel, Pelissier, Bernard, Gambacorti, Narciso
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3589806
File:
PDF, 925 KB
english, 2011
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