Annealing of Cd-implanted GaAs: Defect removal, lattice...

Journal of Applied Physics 1993 Vol. 73; Iss. 9

Annealing of Cd-implanted GaAs: Defect removal, lattice site occupation, and electrical activation

Moriya, N., Brener, I., Kalish, R., Pfeiffer, W., Deicher, M., Keller, R., Magerle, R., Recknagel, E., Skudlik, H., Wichert, Th., Wolf, H., ISOLDE Collaboration,
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Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.354039
File:
PDF, 1.39 MB
english, 1993
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