![](/img/cover-not-exists.png)
Annealing of Cd-implanted GaAs: Defect removal, lattice site occupation, and electrical activation
Moriya, N., Brener, I., Kalish, R., Pfeiffer, W., Deicher, M., Keller, R., Magerle, R., Recknagel, E., Skudlik, H., Wichert, Th., Wolf, H., ISOLDE Collaboration,Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.354039
File:
PDF, 1.39 MB
english, 1993