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Impact of metal gates on remote phonon scattering in titanium nitride/hafnium dioxide n-channel metal–oxide–semiconductor field effect transistors–low temperature electron mobility study
Maitra, Kingsuk, Frank, Martin M., Narayanan, Vijay, Misra, Veena, Cartier, Eduard A.Volume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2821712
File:
PDF, 651 KB
english, 2007