Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1990 / 11 Vol. 8; Iss. 6
Stress migration resistance and contact characterization of Al–Pd–Si interconnects for very large scale integrations
Koubuchi, Y.Volume:
8
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584899
Date:
November, 1990
File:
PDF, 926 KB
english, 1990