Stress migration resistance and contact characterization of...

Stress migration resistance and contact characterization of Al–Pd–Si interconnects for very large scale integrations

Koubuchi, Y.
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Volume:
8
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584899
Date:
November, 1990
File:
PDF, 926 KB
english, 1990
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