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Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating
Awad, Yousef, Lavallée, Eric, Lau, Kien Mun, Beauvais, Jacques, Drouin, Dominique, Cloutier, Melanie, Turcotte, David, Yang, Pan, Kelkar, PrasadVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1647589
File:
PDF, 709 KB
english, 2004