Kinetics of thermal annealing in strained ultrathin Si/Ge...

Journal of Applied Physics 1996 Vol. 80; Iss. 4

Kinetics of thermal annealing in strained ultrathin Si/Ge superlattices on vicinal Si(100) studied by Raman scattering

Chen, Zhenghao, Xiao, Xudong, Au, Stanley, Zhou, Junming, Loy, M. M. T.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
80
Year:
1996
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.363051
File:
PDF, 335 KB
english, 1996
Conversion to is in progress
Conversion to is failed