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[IEEE 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2014.5.19-2014.5.21)] 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) - Uniformity control for high selective down-flow plasma etching on silicon oxide
Fang-Hao Hsu,, Kuo-Feng Lo,, Xin-Guan Lin,, Han-Hui Hsu,, Yuan-Chieh Chiu,, Hong-Ji Lee,, Nan-Tzu Lian,, Tahone Yang,, Kuang-Chao Chen,, Chih-Yuan Lu,Year:
2014
Language:
english
DOI:
10.1109/asmc.2014.6847006
File:
PDF, 314 KB
english, 2014