Constraint Annealing of HfO 2...

Journal of the American Ceramic Society 2013 / 01

Constraint Annealing of HfO 2 Films on Silicon Substrate: Suppression of Si Outward Emission

Shih, Chuan-Feng, Hsiao, Chu-Yun, Chen, Bo-Cun, Hsiao, Yu-Chih, Leu, Ching-Chich, Paranthaman, P.
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Language:
english
Journal:
Journal of the American Ceramic Society
DOI:
10.1111/jace.12151
Date:
January, 2013
File:
PDF, 542 KB
english, 2013
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