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Effects of stress on electrical transport properties of nickel silicide thin layers synthesized by Ni-ion implantation
Zhang, X. W., Wong, S. P., Cheung, W. Y.Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1503409
File:
PDF, 324 KB
english, 2002