Intrinsic stress and hydrogen bonding in glow-discharge...

Journal of Applied Physics 1986 Vol. 59; Iss. 9

Intrinsic stress and hydrogen bonding in glow-discharge amorphous silicon films

Kakinuma, H., Nishikawa, S., Watanabe, T., Nihei, K.
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Volume:
59
Year:
1986
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.336887
File:
PDF, 738 KB
english, 1986
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