![](/img/cover-not-exists.png)
Residual lattice strain in thin silicon-on-insulator bonded wafers: Thermal behavior and formation mechanisms
Iida, Tsutomu, Itoh, Takamasa, Noguchi, Daisuke, Takano, YukioVolume:
87
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.371925
File:
PDF, 373 KB
english, 2000