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[IEEE 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Gainesville, FL, USA (2010.09.28-2010.10.1)] 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Novel chlorine-enriched SiO2/Si3N4 bilayers to downscale gate dielectrics toward sub-45nm and beyond
Wang, Frank. C.C., Lin, Charles CL, Wang, Y.R., Shao Wei Wang,, Tsuo Wen Lu,, Chan, Michael, Chan Lon Yang,, Wu, J YYear:
2010
Language:
english
DOI:
10.1109/rtp.2010.5623791
File:
PDF, 597 KB
english, 2010