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Disorder effects in ion-implanted niobium thin films
Camerlingo, C., Scardi, P., Tosello, C., Vaglio, R.Volume:
31
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.31.3121
Date:
March, 1985
File:
PDF, 147 KB
english, 1985