The doping concentrations of indium-doped silicon measured by Hall, C-V, and junction-breakdown techniques
Schroder, D. K., Braggins, T. T., Hobgood, H. M.Volume:
49
Year:
1978
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.324424
File:
PDF, 491 KB
english, 1978