Sub-100 nm pattern formation using a novel lithography with...

Sub-100 nm pattern formation using a novel lithography with SiNx resist by focused ion beam exposure and dry-etching development

Takahashi, S.
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Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586669
Date:
March, 1993
File:
PDF, 950 KB
english, 1993
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