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Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma
Zhou, H. P., Wei, D. Y., Xu, S., Xiao, S. Q., Xu, L. X., Huang, S. Y., Guo, Y. N., Khan, S., Xu, M.Volume:
112
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4733701
File:
PDF, 1.61 MB
english, 2012