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Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process
Kwon, H. C., Aman-ur-Rehman,, Won, I. H., Park, W. T., Lee, J. K.Volume:
111
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3679107
File:
PDF, 954 KB
english, 2012