process

process

Dillmann, I., Coquard, L., Domingo-Pardo, C., Käppeler, F., Marganiec, J., Uberseder, E., Giesen, U., Heiske, A., Feinberg, G., Hentschel, D., Hilpp, S., Leiste, H., Rauscher, T., Thielemann, F.-K.
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Volume:
84
Language:
english
Journal:
Physical Review C
DOI:
10.1103/PhysRevC.84.015802
Date:
July, 2011
File:
PDF, 437 KB
english, 2011
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