A two-dimensional computer simulation for dry etching using...

Journal of Applied Physics 1989 Vol. 65; Iss. 4

A two-dimensional computer simulation for dry etching using Monte Carlo techniques

Ulacia F., J. Ignacio, McVittie, James P.
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Volume:
65
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.342962
File:
PDF, 1.20 MB
english, 1989
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