Importance of sample preheating in oxidation of GexSi1−x

Importance of sample preheating in oxidation of GexSi1−x

Liu, W. S., Lee, E. W., Nicolet, M-A., Arbet-Engels, V., Wang, K. L.
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Volume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.350922
File:
PDF, 440 KB
english, 1992
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