Current conduction of 0.72 nm equivalent-oxide-thickness LaO/HfO[sub 2] stacked gate dielectrics
Liu, Chuan-Hsi, Chen, Hung-Wen, Chen, Shung-Yuan, Huang, Heng-Sheng, Cheng, Li-WeiVolume:
95
Year:
2009
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3170235
File:
PDF, 551 KB
english, 2009