Erratum: Copper ion transport induced dielectric failure:...

Erratum: Copper ion transport induced dielectric failure: Inclusion of elastic drift and consequences for reliability [J. Vac. Sci. Technol. A 26, 1497 (2008)]

Achanta, Ravi S., Plawsky, Joel L., Gill, William N.
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3054138
File:
PDF, 261 KB
english, 2009
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