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[IEEE Proceedings of IEEE International Electron Devices Meeting - San Francisco, CA, USA (1989.12.3-1989.12.6)] International Technical Digest on Electron Devices Meeting - Correlation of plasma process induced charging with Fowler-Nordheim stress in p- and n-channel transistors
Lee,, Yau,, Chau,, Hansen,, Sabi,, Hui,, Moon,, Vandentop,Year:
1992
Language:
english
DOI:
10.1109/iedm.1992.307310
File:
PDF, 338 KB
english, 1992