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Dry Etching Characteristics of Bi 0.5 (Na 0.82 K 0.18 ) 0.5 TiO 3 Thin Films in Inductively Coupled Plasma
Joo, Young-Hee, Woo, Jong-Chang, Kim, Chang-Il, Ahn, Chang-Won, Seog, Hae-Jin, Kim, Ill-WonVolume:
453
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150193.2013.842100
Date:
January, 2013
File:
PDF, 508 KB
english, 2013