Plasma versus ozone photoresist ashing: Temperature effects...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 1991 / 3 Vol. 9; Iss. 2

Plasma versus ozone photoresist ashing: Temperature effects on process-induced mobile ion contamination

Huynh, Cuc K.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585574
Date:
March, 1991
File:
PDF, 556 KB
english, 1991
Conversion to is in progress
Conversion to is failed